Product
For Harsher Plasma and Higher Sealing Loads
For Harsher Plasma and Higher Sealing Loads
 
Product ID: Puruz P510
Puruz P510 is a specific compound which is designed for use in wide variety of semiconductor dry-etch processing applications with high sealing loads under harsh plasma environment. This product exhibits excellent performance in oxygen and fluorine-based plasmas. Puruz P510 is formulated in high sealing load applications and remains stable at service temperatures as high as 230°C. Class 100 post-cleaning and packaging is adapted for parts made from Puruz P510.
Applications:
- Slit valve doors
- Gas inlet seals
- Window seals
- KF fitting seals
- Gas feed-through seals
- Chamber seals
- Isolator valve seals
- Lid seals
Recommended Processes
- Deposition: CVD, PECVD, HDPCVD...,PVD
- Plasma etching: Oxide, Metal, Poly
- Ashing
- Ion implant
- Remote plasma cleans
- Rapid thermal process
Features:
- Excellent plasma resistance
- Excellent chemical resistance
- Excellent physical properties
- Low out-gassing
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Contact Detail
Address: | No. 41, Wu-Chuan-Wu Road, New Taipei Industrial Park, New Taipei City 24888, Taiwan |
TEL: | +886-2-2298-8556 |
FAX: | +886-2-2299-2189 |
Email: | mfc@mfc.com.tw |
URL: | http://www.mfc.com.tw |
ZIP: | 24888 |