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Excellent Chemical Resistance in Wet Process

Excellent Chemical Resistance in Wet Process

Excellent Chemical Resistance in Wet Process

Product ID: Puruz P320

Designed specifically for chemical resistance in wet processes, the Puruz P320 is an excellent option for use in aggressive chemicals. In processes where chemical compatibility is required such as bases, acids, amines, and steam, it exhibits excellent chemical resistance with minimal metal extraction and good mechanical properties. It is well suited for both static and dynamic applications and Class 100 post-cleaning and packaging is adapted for parts made from Puruz P320.

  • Valve seals
  • V-seals
  • Bell jar seals
  • Filter seals
  • Chamber seals
  • Lid seals
  • Gas inlet seals
  • Isolator valve seals
  • End point windows
  • Slit Valve seals
  • Window seals
  • KF fitting seals


Recommended Processes
  • Deposition: CVD, PVD
  • Wet stripper(Solvents)
  • Wet etching
  • Wet cleaning
  • Wet metal plating


  • Excellent chemical resistance
  • Excellent chemical stability
  • Excellent physical properties
  • Low metal extraction
Typical Physical Properties1
Physical Typical Value
Color Black
Hardness, Shore A2 80
Tensile Strength, MPa 19.6
Elongation, % 184
100% Modulus, MPa 10.49
Compression Set4:
70 hours @ 200°C @ 25% Deflection

Service Temperature Range -20°C~230°C
1 Accumulated Average data.
2 ASTM D2240 (AS 568A 214 O-ring test specimens)
3 ASTM D412 (Dumbbell test specimens)
4 ASTM D395B and ASTM D1414 (AS 568A 214 O-ring test specimens)
Any suggestions made regarding material selections or part designs in this literature are offered as suggestions only based on our experience and understanding of standard application. It is the responsibility of the user to determine full compliance in their particular use. MFC offers no expressed or implied warranties concerning form, fit, or function of any product in any application
Contact Detail
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