Minimal Particulation in Plasma Process, Minimal Contamination in Plasma Process, Conventional Perfluoroelastomer, Excellent Chemical Resistance in Wet Process, Minimal Contamination in Plasma Process
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Minimal Particulation in Plasma Process (Puruz P305 perfluoroelastomer parts)
Minimal Contamination in Plasma Process (Puruz P310 perfluoroelastomer parts)
Conventional Perfluoroelastomer (Puruz P315)
Excellent Chemical Resistance in Wet Process (Puruz P320)
Minimal Contamination in Plasma Process (Puruz P325 perfluoroelastomer parts)
Minimal Contamination in Plasma Process (Puruz P330 perfluoroelastomer parts)
Excellent Chemical and Temperature Resistance (Puruz P335)
Excellent High Temperature Resistance in Diffusion Process (Puruz P340)
For Harsher Plasma and Higher Sealing Loads (Puruz P510)
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