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- Minimal Particulation in Plasma Process (Puruz 7508 perfluoroelastomer parts)
- Minimal Contamination in Plasma Process (Puruz 7509 perfluoroelastomer parts)
- Conventional Perfluoroelastomer (Puruz 7516)
- Excellent Chemical Resistance in Wet Process (Puruz 7517)
- Minimal Contamination in Plasma Process (Puruz 7529 perfluoroelastomer parts)
- Minimal Contamination in Plasma Process (Puruz 7530 perfluoroelastomer parts)
- Excellent Chemical and Temperature Resistance (Puruz 7536)
- Excellent High Temperature Resistance in Diffusion Process (Puruz 7537)
- Excellent High Temperature Resistance (Puruz 8010)
- For Harsher Plasma and Higher Sealing Loads (Puruz 9007)
- Semi, Solar & LCD [11]
- Puruz Material [10]
- Material [12]
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Product
For Harsher Plasma and Higher Sealing Loads
Product ID: Puruz 9007
Puruz 9007 is a mineral filled compound which is designed for use in wide variety of semiconductor dry-etch processing applications where small amounts of contamination are acceptable. This product exhibits excellent performance in oxygen and fluorine-based plasmas. Puruz 9007 is formulated in high sealing load applications and remains stable at service temperatures as high as 230°C. Class 100 post-cleaning and packaging is adapted for parts made from Puruz 9007.
Applications:
- Slit valve doors
- Gas inlet seals
- Window seals
- KF fitting seals
- Gas feed-through seals
- Chamber seals
- Isolator valve seals
- Lid seals
Recommended Processes
- Deposition: CVD, PECVD, HDPCVD...,PVD
- Plasma etching: Oxide, Metal, Poly
- Ashing
- Ion implant
- Remote plasma cleans
- Rapid thermal process
Features:
- Excellent plasma resistance
- Excellent chemical resistance
- Excellent physical properties
- Low out-gassing
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Contact Detail
| Address: | No. 41, Wu-Chuan-Wu Road, New Taipei Industrial Park, New Taipei City, 24888, TAIWAN |
| TEL: | +886-2-2298-8670 |
| FAX: | +886-2-2299-2189 |
| Email: | mfc@mfc.com.tw |
| URL: | http://www.mfc.com.tw |
| ZIP: | 24888 |