Excellent High Temperature Resistance in Diffusion Process
Excellent High Temperature Resistance in Diffusion Process
Product ID: Puruz P340
Puruz P340 is a carbon black-filled compound with good mechanical properties, and low compression set for use in extreme diffusion, CVD and dry process. It exhibits good response to high temperature stability and is well-suited for both static and dynamic applications. It remains stable at service temperatures as high as 324°C. Class 100 post-cleaning and packaging is adapted for parts made from Puruz P340.
Applications:
- Valve seals
- V-seals
- Bell jar seals
- Filter seals
- Chamber seals
- Lid seals
- Gas inlet seals
- Isolator valve seal
- End point windows
- Slit Valve seals
- Window seals
- KF fitting seals
Recommended Processes
- Deposition: CVD, APCVD, HDPCVD..., PVD
- Plasma etching: Oxide, Metal, Poly
- Ashing
- Ion implant
- Remote plasma cleans
- Diffusion
- Rapid thermal process
- Annealing
Features:
- Carbon black-filled material
- Excellent high temperature resistance
- Excellent plasma resistance
- Low out-gassing