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- Automotive Parts [15]
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- O-Rings / O-Ring Kits [1]
- Oil Seals / Radial Shaft Seals [1]
- Semi, Solar & LCD [11]
- Other Applications [1]
- Puruz [2]
- Puruz Material [10]
- Minimal Particulation in Plasma Process (Puruz 7508 perfluoroelastomer parts)
- Minimal Contamination in Plasma Process (Puruz 7509 perfluoroelastomer parts)
- Conventional Perfluoroelastomer (Puruz 7516)
- Excellent Chemical Resistance in Wet Process (Puruz 7517)
- Minimal Contamination in Plasma Process (Puruz 7529 perfluoroelastomer parts)
- Minimal Contamination in Plasma Process (Puruz 7530 perfluoroelastomer parts)
- Excellent Chemical and Temperature Resistance (Puruz 7536)
- Excellent High Temperature Resistance in Diffusion Process (Puruz 7537)
- Excellent High Temperature Resistance (Puruz 8010)
- For Harsher Plasma and Higher Sealing Loads (Puruz 9007)
- Semi, Solar & LCD [11]
- Puruz Material [10]
- Material [12]
- Acrylonitrile Butadiene Rubber (NBR)
- Butyl Rubber
- Chloroprene Rubber (CR)
- Ethylene Propylene Rubber (EPDM)
- Fluoro Elastomers (FKM/FPM)
- Fluorosilicone Rubber (FVMQ)
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- Natural Rubber (NR)
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- Silicone Rubber (VMQ)
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Product
Excellent Chemical and Temperature Resistance
Product ID: Puruz 7536
Puruz 7536 is a carbon black-filled compound with good chemical and mechanical properties, and low compression set for general-purpose use in o-rings, diaphragms, seals, and other parts used in the semi- and TFT-LCD industries. It exhibits good response to temperature cycling effects and is well-suited for both static and dynamic applications, i.e., slit valve door, gas feed-through, chamber seal, etc. It remains stable at service temperatures as high as 260°C. This product also exhibits excellent chemical resistance with minimal metal extraction. Class 100 post-cleaning and packaging is adapted for parts made from Puruz 7536.
Applications:
- Valve seals
- V-seals
- Bell jar seals
- Filter seals
- Chamber seals
- Lid seals
- Gas inlet seals
- Isolator valve seal
- End point windows
- Slit Valve seals
- Window seals
- KF fitting seals
Recommended Processes
- Deposition: CVD, APCVD, HDPCVD..., PVD
- Plasma etching: Oxide, Metal, Poly
- Ashing
- Ion implant
- Remote plasma cleans
- Rapid thermal process
- Wet stripper
- Wet etching
- Wet cleaning
Features:
- Excellent chemical resistance
- Excellent physical properties
- Minimal metal extraction
- Low out-gassing
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Contact Detail
| Address: | No. 41, Wu-Chuan-Wu Road, New Taipei Industrial Park, New Taipei City, 24888, TAIWAN |
| TEL: | +886-2-2298-8670 |
| FAX: | +886-2-2299-2189 |
| Email: | mfc@mfc.com.tw |
| URL: | http://www.mfc.com.tw |
| ZIP: | 24888 |