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7537
Excellent High Temperature Resistance in Diffusion Process

Puruz 7537
Compound Description
Puruz 7537 is a carbon black-filled compound with good mechanical properties, and low compression set for use in extreme diffusion, CVD and dry process. It exhibits good response to high temperature stability and is well-suited for both static and dynamic applications. It remains stable at service temperatures as high as 324°C. Class 100 post-cleaning and packaging is adapted for parts made from Puruz 7537.
Features
  • Carbon black-filled material
  • Excellent high temperature resistance
  • Excellent plasma resistance
  • Low out-gassing
  • Applications
  • Valve seals
  • V-seals
  • Bell jar seals
  • Filter seals
  • Chamber seals
  • Lid seals
  • Gas inlet seals
  • Isolator valve seal
  • End point windows
  • Slit Valve seals
  • Window seals
  • KF fitting seals
  • Recommended Processes
  • Deposition: CVD, APCVD, HDPCVD..., PVD
  • Plasma etching: Oxide, Metal, Poly
  • Ashing
  • Ion implant
  • Remote plasma cleans
  • Diffusion
  • Rapid thermal process
  • Annealing
  • Typical Physical Properties1
    Physical Typical Value
    Color Black
    Specific 2.02
    Hardness, Shore A2 76
    Mechanical3  
    Tensile Strength, MPa 13.5
    Elongation, % 238
    100% Modulus, MPa 6.28
    Compression Set4:
    70 hours @ 230°C @ 25% Deflection, %
    70 hours @ 250°C
    70 hours @ 290°C

    15
    18
    27
    Thermal  
    Service Temperature Range -20°C~324°C
    1 Accumulated Average data.
    2 ASTM D2240 (AS 568A 214 O-ring test specimens)
    3 ASTM D412 (Dumbbell test specimens)
    4 ASTM D395B and ASTM D1414 (AS 568A 214 O-ring test specimens)
    Any suggestions made regarding material selections or part designs in this literature are offered as suggestions only based on our experience and understanding of standard application. It is the responsibility of the user to determine full compliance in their particular use. MFC offers no expressed or implied warranties concerning form, fit, or function of any product in any application