7530 perfluoroelastomer parts
Minimal Contamination in Plasma Process
Compound Description
Puruz 7530 is a compound specifically developed for deposition processes. It has also exhibited excellent etching and stripping process applications. This material provides excellent chemical compatibility and is available in an infinite geometries and cross sections. It has been specifically formulated for ultra-low particle generation in oxygen and fluorine containing plasmas and is well-suited for both static and dynamic applications, i.e., slit valve door, gas feed-through, chamber lid, etc. It remains stable at service temperatures as high as 230°C. Class 100 post-cleaning and packaging is adapted for parts made from Puruz 7530.
Features
Excellent oxygen, chlorine, and fluorine compatibility
1 Accumulated Average data. 2 ASTM D2240 (AS 568A 214 O-ring test specimens) 3 ASTM D412 (Dumbbell test specimens) 4 ASTM D395B and ASTM D1414 (AS 568A 214 O-ring test specimens)
Any suggestions made regarding material selections or part designs in this literature are offered as suggestions only based on our experience and understanding of standard application. It is the responsibility of the user to determine full compliance in their particular use. MFC offers no expressed or implied warranties concerning form, fit, or function of any product in any application
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